Thermal stability of the networks was assessed using TGA, revealing Td5% values of 299°C, 269°C, and 249°C for 3P-4V, 4P-4V, and 4A-4V, respectively. Methylation improved stability, increasing Td5% by 46°C, 65°C, and 59°C for 3P-4MV, 4P-4MV, and 4A-4MV. DSC showed Tg values of 31°C, 52°C, and 59°C for 3P-4V, 4P-4V, and 4A-4V, which rose to 41°C, 79°C, and 89°C for the 4MV series, with higher values indicating increased crosslink density.
DMA testing indicated that storage modulus (E') decreased with temperature, with a single peak on the tanδ curve, reflecting DSC results. The 4MV series showed a storage modulus of 1.38-1.74 GPa at room temperature, comparable to other high-rigidity networks, and demonstrated excellent dimensional stability. Tensile tests revealed smooth, transparent films; 3P-4V exhibited high elongation, while 4P-4V and 4A-4V, with higher crosslink density, showed improved mechanical properties and a glassy state. These properties are due to the rigidity of the 4V/4MV framework and high crosslink density, which restrict chain flexibility and prevent segment sliding. Other tunable thiol-ene systems could be developed by varying thiol compounds.